Interested applicants are invited to apply directly at the NUS Career Portal

Your application will be processed only if you apply via NUS Career Portal

We regret that only shortlisted candidates will be notified.

Job Description

We are seeking a motivated and detail-oriented Research Engineer to support a research project focused on atomic layer etching (ALE) techniques. The goal of the project is to develop highly selective and anisotropic etching processes for silicon, 2D and dielectric materials, essential for next-generation semiconductor device fabrication.

Job Description
• Assist in the development and refinement of ALE process recipes for silicon and various dielectric layers.
• Operate etching equipment and perform routine process monitoring.
• Conduct surface characterization using tools such as ellipsometry, XPS, AFM, and SEM.
• Collaborate with engineers, researchers, and cleanroom staff to support experimental tasks.

Qualifications

Qualifications
• Bachelor's degree in Electrical Engineering, Materials Science, Physics, Chemical Engineering, or a related field.
• Some experience or coursework in semiconductor fabrication, vacuum/plasma systems, or thin film processing is an advantage.
• Willingness to work in a cleanroom and learn hands-on tool operation.
• Strong attention to detail and good organizational skills.
• Ability to work both independently and in a team setting.

Preferred Qualifications:
• Prior exposure to ALD/ALE, plasma etching, or other dry etch techniques.
• Familiarity with tools such as Oxford Instruments, Lam Research, or Plasma-Therm systems.
• ls Open to Fixed Term Contract.